发明名称 Process for the preparation of polycrystalline silicon ingot
摘要 This invention relates to a process for the preparation of polycrystalline silicon ingots by providing a first layer of coating on the inside walls of a mold with a slurry of silicon nitride powder in an organic binder dissolved in a solvent; charging the said coated mold with silicon pieces along with calcium chloride or/and calcium fluoride; heating the mold to a temperature in the range of 1420 DEG -1500 DEG C. so as to melt the silicon, by keeping the mold inside the furnace; bringing down the temperature of the mold to a temperature 5 DEG -10 DEG C. above the melting point of silicon; withdrawing the mold containing the melt downwardly and slowly from the hot zone of the furnace so that the solidification of the melt starts from the bottom of the mold and proceeds towards the top as the withdrawal continues till all the melt solidifies; cooling the mold to the room temperature under inert atmosphere and removing the polycrystalline silicon ingot from the mold.
申请公布号 US5431869(A) 申请公布日期 1995.07.11
申请号 US19930003455 申请日期 1993.01.12
申请人 COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH 发明人 KUMAR, SINGH P.;PRAKASH, PREM;KISHORE RAM;SINGH SHIV NATH;DAS BIJOY KISHORE
分类号 B29C33/56;C30B11/00;(IPC1-7):B29C33/56 主分类号 B29C33/56
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