发明名称 Semiconductor device including an anode layer having low density regions by selective diffusion
摘要 A semiconductor diode characterized by an anode electrode structure connected to a double diffusion of P-type impurities in a major surface of an N- semiconductor. The first diffusion forming a first plurality of P- well regions and the second diffusion selectively forming a second plurality of P+ well regions within the first well region.
申请公布号 US5432360(A) 申请公布日期 1995.07.11
申请号 US19940202195 申请日期 1994.02.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HOHYUN;PARK, CHANHO
分类号 H01L29/73;H01L21/331;H01L21/8222;H01L27/06;H01L29/47;H01L29/732;H01L29/861;H01L29/872;(IPC1-7):H01L29/861;H01L29/885 主分类号 H01L29/73
代理机构 代理人
主权项
地址