发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PURPOSE:To firmly adhere a pellicle film to a pellicle frame without wrinkling or distorting the film by making the glass transition temp. of the adhesive lower than that of the film. CONSTITUTION:A pellicle film is adhered to a pellicle frame with an adhesive consisting of polymer. An amorphous fluorinated polymer is preferably used as the material for the pellicle film. An amorphous fluorinated polymer identical with or similar to that of the pellicle film is preferably used as the adhesive. The glass transition temp. of the adhesive is made lower than that of the pellicle film at least by >=5 deg.C or preferably by >=20 deg.C. As a result, even if the adhering temp. is made higher than the glass transition temp. of the adhesive to increase the adhesive strength, the temp. of the pellicle film is never increased above the glass transition temp.</p>
申请公布号 JPH07168345(A) 申请公布日期 1995.07.04
申请号 JP19930311913 申请日期 1993.12.13
申请人 SHIN ETSU CHEM CO LTD 发明人 HAMADA YUICHI;KAWAKAMI SATOSHI;SHIRASAKI SUSUMU;NAGATA AKIHIKO;KASHIDA SHU;KUBOTA YOSHIHIRO
分类号 C09J127/12;G03F1/62;G03F1/64;G03F7/20;H01L21/027;(IPC1-7):G03F1/14 主分类号 C09J127/12
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