发明名称 |
THIN-FILM TRANSISTOR AND ITS MANUFACTURE |
摘要 |
<p>PURPOSE:To realize a reliable thin-film transistor at high yield rate while improving step coverage at edges of a gate electrode as well as decreasing failures such as discontinuity and degraded insulation. CONSTITUTION:A thin-film transistor has a gate electrode composed of a first metal layer 2 of aluminum and a second metal layer 8 of aluminum containing anodizable metallic impurity. The second metal layer has an anodized surface 3 and completely covers the first metal layer. When this thin-film transistor is used as a switching element for a TFT-LCD, it is possible to remarkably reduce the resistance of gate lines, thus eliminating the problem of gate signal delay. Further, a reliable TFT-LCD can be realized at a high yield rate.</p> |
申请公布号 |
JPH07162000(A) |
申请公布日期 |
1995.06.23 |
申请号 |
JP19930303642 |
申请日期 |
1993.12.03 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
TAMURA TATSUHIKO;TSUBOI NOBUYUKI;INOUE MAYUMI;EZAKI HIROSHI;TAKEDA MAMORU |
分类号 |
G02F1/136;G02F1/1368;H01L21/28;H01L29/78;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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