| 摘要 |
A method of manufacturing a semiconductor device includes the step of providing a reaction chamber (3) in which a layer of material (2) is deposited on a semiconductor slice (1) which is placed on a support (4) in the reaction chamber, a process gas being conducted towards the slice (1) through a gas inlet system (6) which is provided with a perforated gas inlet plate (9) arranged opposite the support (4). The reaction chamber is, between depositions, periodically cleaned through generation of a plasma between the support (4) and the gas inlet plate (9) in a gas mixture comprising fluorine or a fluorine compound and oxygen or an oxygen compound. A portion of the gas mixture which is comparatively rich in oxygen is conducted into the reaction chamber through the gas inlet system (6) with the gas inlet plate (9), while a portion of the gas mixture comparatively poor in oxygen is conducted into the reaction chamber through an auxiliary inlet system (23). The cleaning plasma as a result is comparatively rich in oxygen close to the gas inlet plate. An attack on the gas inlet plate by the plasma is counteracted in this way, and deposition on the gas inlet plate of polymers formed in the plasma is suppressed. An optimum cleaning plasma is present on average between the gas inlet plate (9) and the support (4).
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