发明名称 |
Microstructures and high temperature isolation process for fabrication thereof |
摘要 |
A method of fabricating released microelectromechanical and microoptomechanical structures having electrically isolating segments from single crystal silicon includes thermal oxidation steps. The structures are defined using a single mask patterning process, and the structure is partially thermally oxidized. This is followed by a second masking step which is used to define segments to be completely thermally oxidized, and a second oxidation step completes the fabrication of the isolating segment. Thereafter the structure is released from the underlying substrate. |
申请公布号 |
US5426070(A) |
申请公布日期 |
1995.06.20 |
申请号 |
US19930067089 |
申请日期 |
1993.05.26 |
申请人 |
CORNELL RESEARCH FOUNDATION, INC. |
发明人 |
SHAW, KEVIN A.;ZHANG, Z. LISA;MACDONALD, NOEL C. |
分类号 |
B81B1/00;G01P15/08;(IPC1-7):H01L21/44 |
主分类号 |
B81B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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