| 摘要 |
PURPOSE:To accurately detection the presence and size of foreign matter attached even when inspection light is reflected partially on a film surface of a pericle. CONSTITUTION:A pattern 17 is made up of a light shielding film 2 at a specified position about 1-10mm further inside from the inside of a mounting position 16 of a pericle outside an area where the pattern is formed. The pattern 17 is made impossible to be discriminated from foreign matter with a mask foreign matter detector using a laser. Prior to the mounting of the pericle, an inspection of a photomask is performed with the foreign matter detector. As a result, the pattern 17 impossible to be discriminated from the foreign matter is recognized as foreign matters and the detection level thereof is recorded. Then, the pericle is mounted to perform an inspection with the detector. When the detection level of the pattern 17 impossible to be discriminated from the foreign matter as foreign matters is different as compared with that before the mounting of the pericle, the sensitivity of the detector is adjusted and an inspection is performed again. |
