VERNIER STRUCTURE FOR MEASURING OVERLAP ACCURACY AND MEASURING METHOD OF OVERLAP ACCURACY

摘要

PURPOSE:To reduce the stepped section of vernier, and to suppress the measurement error of overlap accuracy. CONSTITUTION:In vernier for measuring overlap accuracy for with a pre-process in a photolithographic process, a pattern in the pre-process as a main scale 11 is formed by a punching pattern, and a vernier 13 is arranged in a punching region.