PRODUCTION OF PHASE SHIFT MASK BLANK AND PRODUCTION OF PHASE SHIFT MASK

摘要

PURPOSE:To produce a phase shift mask blank with an etching stopping layer having acid resistance as well as basic properties as an etching stopping layer and to produce a phase shift mask. CONSTITUTION:An etching stopping layer 2 for stopping the etching of a phase shift layer 3 at the time of etching the layer 3 is made of a material contg. Al2O3 and SnO2 and the etching stopping layer 2 is heat-treated to produce the objective phase shift mask blank with an etching stopping layer 2 having superior acid resistance as well as basic properties as an etching stopping layer. The objective phase shift mask is produced using the phase shift mask blank.