| 摘要 |
PURPOSE:To obtain a joined body which is simply and strongly joined and has the strength which withstands the temp. of >=1000 deg.C by joining the surface of the active metal layer formed at the joint surface of ceramic and a heat- treated silicon surface with a metallic material. CONSTITUTION:The film of the active metal such as titanium is formed on the non-oxide material-based ceramic such as silicon nitride and carbon nitride in an Ar atmosphere of order of 5X10<-3>Torr by a sputtering method to form the active metal layer of a titanium film having 1000-3000Angstrom thickness, then, the film is subjected to a heat treatment at 800-1200 deg.C in vacuum to form TiN or TiC at the boundary of the non-oxidized ceramic and the titanium film. An opposite silicon is subjected to the heat treatment at about 1150 deg.C in a carbon atmosphere and its surface is converted into SiC, and the metallic plate consisting of gold or gold-nickel is inserted between the non-oxide ceramic and the titanium film, and is subjected to a heat joining at 1063 deg.C (m.p. of gold)-1150 deg.C in the case of a pure gold and at 1020-1100 deg.C in the case of a gold-nickel. |
