发明名称 POSITION MEASURING METHOD AND POSITIONING METHOD OF MOVING STAGE AND THEIR EQUIPMENT
摘要 <p>PURPOSE:To continuously obtain accurate values when the uneven form of a Y mirror (X mirror) is measured, by continuously monitoring, correcting and measuring the yaw generated when a stage is moved in the X direction (Y direction), with two noncontact displacement meters which continuously radiate parallel beams in the X direction (Y direction). CONSTITUTION:A stage 5 is moved in the X (or Y) direction and rotated around the Z axis vertical to the X-Y plane, in the manner in which the distances measured by two noncontact displacement meters 81X, 82X for an X mirror (or 81Y, 82Y for a Y mirror) become continuously equal. At the same time, by using either one of the noncontact displacement meters 81Y, 82Y for the Y mirror (or 81X, 82X for the X mirror), the uneven form is measured and stored in the mirror long axis direction. In the similar manner, the uneven form of the reflecting surface of the X (or Y) mirror is measured and stored in the mirror long axis direction. The coordinate position of the stage 5 is expressed by the coordinate values subjected to addition and correction by the obtained uneven form coordinate values in the coordinate.</p>
申请公布号 JPH07122476(A) 申请公布日期 1995.05.12
申请号 JP19930264509 申请日期 1993.10.22
申请人 HITACHI LTD 发明人 NAKAJIMA YOSHIO;AKATSU TOSHIO;SUGA KAZUTOSHI
分类号 G01B11/00;B23Q16/00;B23Q17/24;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G01B11/00
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