发明名称 Method of manufacturing a thin film transistor
摘要 There is provided a TFT having a trench surrounding gate structure that is capable of decreasing the leakage current generated during the Off-State of the TFT by securing enough channel length despite the smallness of the area, increasing the driving current by securing a sufficient cross-sectional area of an inverted channel during the On-State of the TFT, and improving the resolution of the LCD by reducing the space occupied by the TFT in the panel during the manufacturing of the LCD.
申请公布号 US5407846(A) 申请公布日期 1995.04.18
申请号 US19930085559 申请日期 1993.06.30
申请人 CHAN, HA HYOUNG 发明人 CHAN, HA HYOUNG
分类号 H01L29/78;H01L21/336;H01L29/786;(IPC1-7):H01L21/265 主分类号 H01L29/78
代理机构 代理人
主权项
地址