摘要 |
The invention relates to a process for producing wear-resistant layers of cubic boron nitride or wear-resistant layers containing it by sputtering with r.f. or d.c. voltage in the operating mode as an unbalanced magnetron, in which the plasma is generated by d.c. arc discharges or d.c.-operated magnetron cathodes. According to the invention, the initial target for the production of the layer from which the material is removed consists of electrically conductive material containing boron, preferably boron carbide, and, in the process, the reactive process is conducted with the addition of N2 and Ar in such a way that the necessary stoichiometric ratio B:N in the layer can be adjusted.
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申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN, DE |
发明人 |
LUETHJE, HOLGER, DIPL.-ING., 25469 HALSTENBEK, DE;BEWILOGUA, KLAUS, DR., 22844 NORDERSTEDT, DE;DAAUD, SIMONE, DIPL.-ING., 23562 LUEBECK, DE |