发明名称 |
Positive working photoresist composition. |
摘要 |
<p>A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.</p> |
申请公布号 |
EP0644460(A1) |
申请公布日期 |
1995.03.22 |
申请号 |
EP19940114717 |
申请日期 |
1994.09.19 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KAWABE, YASUMASA, C/O FUJI PHOTO FILM CO., LTD.;SATOH, KENICHIRO, C/O FUJI PHOTO FILM CO., LTD.;AOAI, TOSHIAKI, C/O FUJI PHOTO FILM CO., LTD. |
分类号 |
C08G8/20;G03F7/022;G03F7/023;(IPC1-7):G03F7/022 |
主分类号 |
C08G8/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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