发明名称 Method of fabricating a semiconductor device
摘要 In order to simplify the structure of a power amplifying transistor and improve its high-frequency characteristics, a base electrode (7b) and a collector electrode (7c) are formed on the surface of such a power amplifying transistor, while an emitter electrode (7e) is formed on its rear surface. Since it is possible to easily ground the emitter electrode (7e) and use the base and collector electrodes (7b, 7c) as an input and an output respectively, the structure is simplified and no wiring pattern is required, whereby high-frequency characteristics can be improved.
申请公布号 US5399510(A) 申请公布日期 1995.03.21
申请号 US19940190496 申请日期 1994.02.02
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TANIGUCHI, AKIHISA
分类号 H01L29/417;H01L21/331;H01L29/08;H01L29/73;H01L29/732;(IPC1-7):H01L21/265 主分类号 H01L29/417
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