| 摘要 |
PURPOSE:To obtain a transferred imaging body with especially improved fade resistance by providing an ultraviolet deterioration-resistant layer on the upper face of a base on which a pattern is formed of a sublimating or vaporizing functional material and providing a gas-impermeable and stain-resistant material layer thereon. CONSTITUTION:An ultraviolet deterioration-resistant layer is provided on the upper face of a base on which a pattern is formed of a sublimating or vaporizing functional material and a gas-impermeable and stain-resistant material layer is provided thereon. In this case, the ultraviolet deterioration-resistant layer is made of a benzotriazole type ultraviolet absorbent layer and the gas- impermeable and stain-resistant layer is made of a fluororesin film or sheet. It is possible thereby to prevent the sublimating or vaporizing ultraviolet absorbent from transmitting and permeating even when the ultraviolet absorbent is heated and to stop easily ultraviolet rays, ozone, steam, etc. It is possible thereby to improve durability and fade resistance of the pattern obtd. by means of a sublimation transfer method and to prevent it from staining. |
