| 摘要 |
PURPOSE:To obtain a resist remover which dissolves a resist at a speed not lower than in the case of an org.-solvent-based remover and does not stain the surface of copper by adding a specific surfactant to an aq. soln. of an alkali metal hydroxide. CONSTITUTION:A resist remover comprises an alkyldiphenyl ether disulfonate of formula I (wherein R is 9-15C alkyl; and X is an alkali metal) pref. in an amt. of 4-6wt.%, polyoxyethylene nonylphenyl ether of formula II (wherein n is 15-19) pref. in an amt. of 0.1-2wt.%, an alkali metal hydroxide (usually NaOH) pref. in an amt. of 1-3wt.%, and water. |
