| 摘要 |
In order to manufacture lightweight mirror structures or other reflecting assemblies, there are applied, to a porous carbon supporting framework (CFC or CMC) having the dimensions of the assembly to be manufactured, shaped parts made of silicon and having an adequate wall thickness, at temperatures between 1300 DEG C and 1600 DEG C in vacuo or in a protective gas (inert gas) atmosphere, which directly results in the formation of mirror structures or reflectors. It is possible to operate at temperatures of 300-600 DEG C if the shaped parts made of silicon, especially wafers, are bonded to the supporting framework via a zone of a melt eutectic, introducing a non-ferrous metal, especially gold. Finally the surfaces are coated. <IMAGE> |
