| 摘要 |
<p>PURPOSE: To remove resist contaminant quickly and completely using a chemical substance requiring no special waste processing by irradiating an object in a chamber with UV-rays, applying a developer fluid and a surfactant solution to the object, washing the object with water and then drying the object by blowing the air into the chamber. CONSTITUTION: A contaminated cassette 16 and a carrier 18 are set in a process chamber 10 and irradiated with UV-rays for the purpose of perfect exposure of an arbitrary resist flake. Concentrated developer is then sprayed through a spray nozzle 24 or atomized in order to impregnate the cassette 16 and the carrier 18 with the developer thus dissolving the contaminants. After finishing simple ultrapure water washing, a surfactant mixing valve 60 is opened, and a solution of surfactant/ultrapure water is sprayed into the chamber 10 in order to wash away granular matters. Finally, high-temperature ultrapure water is sprayed and heated, filtered and ionized ultralow particle air is blown into the process chamber 10 in order to dry the part under processing.</p> |
