发明名称 |
RETICLE TRANSPORTER |
摘要 |
Precisely adjustable transporter for moving a reticle past an optical slit as a step in the production of semiconductor wafers. The reticle stage rides along a pair of optically flat planar, intersecting, bearing surfaces supported by air bearings on each bearing surface. Pressurized air and vacuum may be simultaneously employed to effect substantially friction-free motion while preventing displacement from the bearing surfaces. Axial adjustments on each air bearing permit precise adjustment of the reticle stage and reticle. |
申请公布号 |
KR950001724(B1) |
申请公布日期 |
1995.02.28 |
申请号 |
KR19870006193 |
申请日期 |
1987.06.19 |
申请人 |
SVG LITHOGRAPHY SYSTEMS INC. |
发明人 |
LAGANZA, JOSEPH L.;ENGELBRECHT, OREST |
分类号 |
G03F9/00;B23Q1/00;B23Q1/28;B23Q1/38;F16C29/02;G01B5/00;G03F7/20;H01L21/027;H01L21/30;H01L21/68 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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