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发明名称
LOW PRESSURE CVD EQUIPMENT AND FILM FORMING METHOD
摘要
申请公布号
JPH0745532(A)
申请公布日期
1995.02.14
申请号
JP19930208429
申请日期
1993.07.30
申请人
SONY CORP
发明人
HASEGAWA TOSHIAKI
分类号
H01L21/205;(IPC1-7):H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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