发明名称 COMPOSITION FOR POLYMERIZATION AND RESIN MATERIAL
摘要 PURPOSE:To obtain a composition for polymerization which has good heat resistance, satisfactory surface properties including excellent surface precision, a high refractive index, and excellent transparency and is suited for producing an optical part by mixing a specific sulfurized bis(meth)acrylate with a specific phosphoric ester. CONSTITUTION:The composition comprises 100 pts.wt. sulfurized bis(meth) acrylate represented by formula I and 0.01-3 pts.wt. phosphoric ester represented by formula II. In the formulae, R<1>'s each independently is H or methyl; R<2> s and R<3>'s each independently is a 1-12C hydrocarbon group; X is a halogen other than fluorine; n is O or 1-4; and R<4>, R<5>, and R<6> each independently is H or a 1-20C alkyl, aryl, or aralkyl, provided that at least one of R<4>, R<5>, and R<6> is not H. The composition has not only a high refractive index but a high Abbe number, suffers no discoloration during heating, and retains close contact with a mold when a molding is produced therefrom by casting polymerization.
申请公布号 JPH0741519(A) 申请公布日期 1995.02.10
申请号 JP19930185899 申请日期 1993.07.28
申请人 MITSUBISHI CHEM CORP 发明人 WATARI FUMIE;HAYAKAWA SEIICHIRO;ISAKA TSUTOMU
分类号 C08F2/44;C08F20/38;C08K5/521;C08L33/04;C08L33/14;G11B7/253 主分类号 C08F2/44
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