发明名称 PROCESS FOR PRODUCING HIGH-RESISTANCE SILICON CARBIDE
摘要 A process is disclosed for producing high-resistance SiC from a low-resistance starting material. The flat donor levels of a prevailing nitrogen impurity are overcompensated by admixture of a trivalent element, the concentration of said doping element in the SiC being such that it changes the conductivity type from a n-conductivity to a p-conductivity. In addition, a transition element is added having donor levels approximately in the middle of the SiC energy gap, so that the excess acceptor levels are in turn compensated and a high specific resistance is achieved.
申请公布号 WO9504171(A1) 申请公布日期 1995.02.09
申请号 WO1994EP02400 申请日期 1994.07.21
申请人 DAIMLER-BENZ AKTIENGESELLSCHAFT;FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAND;NIEMANN, EKKEHARD;SCHNEIDER, JUERGEN;MUELLER, HARALD;MAIER, KARIN 发明人 NIEMANN, EKKEHARD;SCHNEIDER, JUERGEN;MUELLER, HARALD;MAIER, KARIN
分类号 C30B29/36;C30B23/00;C30B23/02;H01L21/04;H01L21/322;H01L29/161;H01L29/24;H01L29/38 主分类号 C30B29/36
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