Process for the production of microstructure elements

摘要

The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with X-rays and removal of the regions of the polymers which have been irradiated imagewise, where the polymers, before the imagewise irradiation, are firmly anchored to an electroconductive support in layer thicknesses of from several mu m into the mm region by polymerisation of the monomer(s) making up the polymer in the presence of a polymerisation catalyst, and, if desired, conditioning at temperatures between the glass transition temperature and the melting point of the polymer. The novel process is particularly suitable for the production of microstructure elements having structure depths of from 3 mu m to 2000 mu m and lateral dimensions of less than 10 mu m.