| 摘要 |
PURPOSE:To provide a positive type resist soln. preventing the deposition of the photosensitive component of the resist, undergoing no change of the sensitivity and viscosity with the lapse of time, excellent in shelf stability, having high resolution, a wide defocus margin and practicality and especially suitable for use in the production of a semiconductor device. CONSTITUTION:An alkali-soluble resin (A), a compd. (B) having a quinone- diazido group and phosphorous ester (C) represented by a general formula P(OR)3 (where R is lower alkyl) are dissolved in propylene glycol monoalkyl ether acetate. The amt. of the component C is 0.001-0.1wt.% of the total amt. of the components A, B. The objective positive type resist soln. is obtd. |
