| 摘要 |
PURPOSE:To restrain developer from being consumed by limiting the amount of the developer supplied from a nozzle only onto a substrate. CONSTITUTION:This substrate developing device for developing a rectangular substrate 3 coated with photoresist and exposed to be a specified pattern by the developer is provided with a substrate holding part 4, a developer supplying part 5, and a movable frame 9. The substrate holding part 4 holds the substrate 3 in a horizontal direction. The developer supplying part 5 has the nozzle part 7 extended in the short direction of the substrate 3 along the upper surface of the substrate 3, and the developer is discharged from the nozzle part 7 to the substrate 3. The movable, frame 9 moves the nozzle part 7 in the longitudinal direction of the substrate 3 along the upper surface of the substrate 3, and also moves it up and down. The nozzle part 7 starts scanning from a position slightly closer to a central part than the the starting end of the substrate 3, and moves in a direction obliquely separating from the substrate 3 at the end of the substrate 3. |
