| 摘要 |
PURPOSE:To realize multilayered films having the high accuracy extremely approximate to a target. CONSTITUTION:This film forming device is composed of a substrate 8 which is installed in a film forming chamber 1 and is formed with the multilayered films thereon, an optical film thickness monitor substrate 10 which controls the optical film thicknesses of the respective layers of the multilayered films, a monitor exchange mechanism 16 which exchanges the optical film thickness monitor substrate 10 by each layer, a multilayered film monitor substrate 17 which is arranged in the lower side part of the optical film thickness monitor substrate 10 and observes the spectral characteristics of the multilayered films, a light source 11 which casts light to the optical film thickness monitor substrate 10 and the multilayered film monitor substrate 17, an optical lens which shapes the light emitted from the light source 11, an optical window 21 which makes the light incident on the inside and outside of the film forming chamber 1 and emits the light therefrom, a detector 14 which detects the quantity of the light reflected from the optical film thickness monitor substrate 10 and a spectral characteristic evaluating device 20 which measures the spectral characteristics of the light reflected from the multilayered film monitor substrate 17. The multilayered film monitor substrate 17 is so fixed to a holding jig as not to tilt for >=10minutes from the installed state. |
