ECR PLASMA GENERATING APPARATUS AND METHOD THEREOF

摘要

The ECR generator increases the inner uniformity of plasma by spontaneously controlling distributions of plasma using multiple solenoids which produce magnetic fields by supplying different power for each conductor wire. The generator consists of multiple solenoids (1) with windings of conductor wires, a D.C circuit (8) supplying currents for each coil of poly-solenoids, and a controller or a computer (9) controlling variable currents. It overcomes a limit from a shape and makes uniform semiconductor etching and deposition by minimizing a high-frequency bias voltage.