Wafer holder method and apparatus in a vacuum deposition system

摘要

A method and apparatus for maintaining orientation of a wafer with respect to the wafer holder and a source emission is disclosed. Briefly stated, a wafer is disposed on a wafer holder and displaced in translation only while made to continuously follow a planar closed path which allows the rotation of the wafer with respect to source of emission while keeping the wafer and the wafer holder uniformly aligned with respect to each other.