| 摘要 |
PURPOSE:To obtain an interference exposure device with which a light path can be changed easily and the deterioration in quality of interference light is suppressed by reducing the number of optical parts in the light path. CONSTITUTION:An incident light 1a is divided into two parts by a splitter 11. A transmitted light 1b passes through an aperture 12 and projected on the substrate 14 on a rotating device 13. A reflected light 1c is reflected by a reflecting mirror 15, and it is directed to the substrate 14, passing through an aperture 17. The angle of rotation of the substrate 14 on the rotating device 13 is half of the rotation angle of the arm 16 of the rotating device 13. When the angle formed by two interference lights is changed, the objective angle of the arm 16 is set. The substrate 14 is rotated at the angle half of that of the arm 16 by the rotating device 13, and the transmitted light 1b, which is an interference light, and the bisector of the transmitted light 1b and the reflected light 1c, which are interference lights, and the normal line on the substrate surface are aligned. The reflection light 1c is adjusted by rotating and translating the reflecting mirror 15 so that the reflected light 1c passes through the aperture 17 in the arm 16 and reaches the center axis of the rotating device 13. |
