发明名称 High temperature rectifying contact including polycrystalline diamond and method for making same
摘要 A rectifying contact including a refractory metal carbide layer on a polycrystalline diamond layer provides high temperature operation and may be included in semiconductor devices, such as diodes and field effect transistors. The refractory metal carbide layer forms a substantially chemically non-reactive interface with the polycrystalline diamond. A single layer of substantially stoichiometric proportions of the refractory metal layer is provided in one embodiment of the rectifying contact. Another embodiment includes a second metal-rich refractory metal carbide layer on the stoichiometric layer. Yet another embodiment includes a carbon-rich refractory metal layer between the stoichiometric layer and the polycrystalline diamond layer. A metal field effect transistor including the rectifying contact may also be fabricated. A method for making the rectifying contact includes depositing a layer, or layers, of the refractory metal carbide on the polycrystalline diamond, as contrasted with a solid state reaction to form the refractory metal carbide. Another method includes depositing the polycrystalline diamond on a refractory metal carbide layer.
申请公布号 US5384470(A) 申请公布日期 1995.01.24
申请号 US19920970252 申请日期 1992.11.02
申请人 KOBE STEEL, USA, INC. 发明人 TACHIBANA, TAKESHI;THOMPSON, JR., DALE G.;GLASS, JEFFREY T.
分类号 H01L29/16;H01L29/47;(IPC1-7):H01L23/48;H01L23/52 主分类号 H01L29/16
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