| 发明名称 |
Control of time-dependent haze in the manufacture of integrated circuits. |
| 摘要 |
The onset of haze on silicon wafers is controlled by treating the wafers with a chemical selected from the group consisting of hot water and isopropyl alcohol and then storing the treated wafers in an inert atmosphere such as nitrogen or argon. |
| 申请公布号 |
EP0602842(A3) |
申请公布日期 |
1995.01.18 |
| 申请号 |
EP19930309640 |
申请日期 |
1993.12.02 |
| 申请人 |
AT & T CORP |
发明人 |
OBENG YAW SAMUEL;VAJDA EDWARD J |
| 分类号 |
H01L21/304;H01L21/306;H01L21/324 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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