发明名称 Semiconductor memory device
摘要 A non-volatile memory element comprising a control gate formed by a diffusion layer, a floating gate comprising a conductive layer, the floating gate being partly overlapping with the control gate through a thin insulating layer, and a barrier layer formed to cover a part or the entire part of the floating gate is used as a defect remedy circuit for the memory circuit having read-only memory elements arranged in the form of a matrix for storing defective addresses corresponding to the word lines and bit lines and storing data corresponding thereto respectively.
申请公布号 US5383162(A) 申请公布日期 1995.01.17
申请号 US19920935176 申请日期 1992.08.26
申请人 HITACHI, LTD.;HITACHI VLSI ENGINEERING CORP. 发明人 SHIRAI, MASAKI;MORIUCHI, HISAHIRO;YOSHII, YASUHIRO;KURODA, KENICHI;MATSUO, AKINORI
分类号 G11C29/00;H01L27/112;H01L27/115;(IPC1-7):H01L27/10;G11C11/40 主分类号 G11C29/00
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