发明名称 METHOD FOR DRYING RESIST FILM FORMED BY ELECTRODEPOSITION.
摘要 <p>A method of forming a photosensitive resist film for the manufacture of finely-machined precision parts, by which dehydration and baking of a resist film can be done by a short-time heating, the resist film formed is of a resolution much higher than conventional, and thin-film drying can be performed. After the electrodeposition coating, the resist film (2) is rolled by pressure rollers (4) while being heated. &lt;IMAGE&gt;</p>
申请公布号 EP0633716(A1) 申请公布日期 1995.01.11
申请号 EP19940905211 申请日期 1994.01.27
申请人 NIPPON PAINT CO., LTD. 发明人 MATSUO, SEIICHI, 5-3, AWAJI 2-CHOME;NAGATA, KOUICHI, 4-78-304, MIIGAOKA 4-CHOME;TANAKA, SHIGEHARU, 14-177, FUKAKUSA FUCHICHO;SHIMIZU, MAKOTO, 8-26, KITATANABE 6-CHOME
分类号 G03F7/16;H05K3/00;H05K3/06;(IPC1-7):H05K3/06 主分类号 G03F7/16
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