| 摘要 |
PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance, having high sensitivity and hardly generating scum to a resist profile. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin, 1,2-naphthoquinonediazido-4-sulfonic ester or 1,2-naphthoquinonediazido-5- sulfonic ester and carboxyindene-3-sulfonic ester or carboxyindene-4-sulfonic ester. |
