| 摘要 |
PURPOSE:To supply a developing solution to a photoresist film at the optimum concentration and, at the same time, to prevent the occurrence of dimensional fluctuation in developed resist images. CONSTITUTION:A high-concentration developing solution 15 is put in a developing tank 13 and the solution 15 is connected to a mixing tank 19 through a regulator 16, filter 17, and first pump 18. The tank 19 is connected to a second pure water line 24b through a second pump 23 and to a heat exchanger 26 through a first developing solution line 25a. The heat exchanger 26 is connected to a developing nozzle 27 through a second developing solution line 25b. The line 25b is connected to a third developing solution line 25c through a eighth valve 12h and the line 25c is connected to the mixing tank 19 through a second concentration sensor 28. When the developing solution 15 is mixed with pure water in the tank 19 by using such a developing device, a developing solution having the optimum concentration can be supplied to photoresist films. |
