| 发明名称 |
RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING THE SAME |
| 摘要 |
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
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| 申请公布号 |
KR20090074170(A) |
申请公布日期 |
2009.07.06 |
| 申请号 |
KR20097006350 |
申请日期 |
2007.09.25 |
| 申请人 |
ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BANINE VADIM YEVGENYEVICH;FRANKEN JOHANNES CHRISTIAAN LEONARDUS;FRIJNS OLAV WALDEMAR VLADIMIR;KLUNDER DERK JAN WILFRED;DRIESSEN NIELS MACHIEL;SOER WOUTER ANTHON |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
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