发明名称 Shaping using area patterning mask.
摘要 <p>Sculpturing by ablation is controlled on an area basis by a mask pattern which determines transmission, e.g. of a laser beam, in accordance with the desired degree of ablation as a function of position. In one embodiment, a set of binarally weighted masks (A-H) is employed to produce a required change in the configuration of the surface of the workpiece being sculptured. This is illustrated by Fig. 3, showing at the left hand side the relative amounts of material to be removed in four adjacent pixels, and to the right of this a set of four pattern masks by the successive use of which these amounts can be ablated in total for each pixel.</p>
申请公布号 EP0417952(B1) 申请公布日期 1994.12.07
申请号 EP19900309611 申请日期 1990.09.03
申请人 COLLOPTICS, INC. 发明人 ROSE, JAMES WILSON;LEVINSON, RONNEN M.;LIU, YUNG SHENG
分类号 G03F1/08;A61F9/00;A61F9/007;A61F9/008;A61F9/01;B23K26/06;G03F7/20;H01S3/00;(IPC1-7):B23K26/06 主分类号 G03F1/08
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