发明名称 Ultraviolet resistive antireflective coating and method of fabrication.
摘要 <p>A coating for an optical component is formed to be antireflective for a selected wavelength and resistive to the transmission of ultraviolet radiation. The coating has first layer (24A,24B) is formed of a dielectric material having a refractive index n1 coated onto the optical component. A second layer (26A,26B) is formed of a dielectric layer having a refractive index n2 that is smaller than the refractive index n1 of the first layer. The second layer (26A,26B) is formed of a material that transmits the selected wavelength while blocking ultraviolet light, thereby protecting the first layer (24A,24B) and the optical component (12) from damage due to exposure to ultraviolet radiation. The thicknesses of the layers is selected so that the coating is antireflective for the selected wavelength.</p>
申请公布号 EP0626596(A1) 申请公布日期 1994.11.30
申请号 EP19940303686 申请日期 1994.05.23
申请人 LITTON SYSTEMS, INC. 发明人 LU, SAMUEL;SUN, MING-JAN;STEWART, ALAN F.;LOUDERBACK, ANTHONY W.
分类号 G01B9/02;G01C19/66;G01P9/00;G02B1/10;G02B1/11;G02B5/28;H01S3/08;(IPC1-7):G02B1/10 主分类号 G01B9/02
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