| 摘要 |
PURPOSE:To judge whether a foreign object is located on front or rear surface of a pellicle film when inspecting the pellicle film. CONSTITUTION:The inspecting machine is provided with a detection system 3 consisting of a light source 1 where an inspection light with a wavelength passing through the surface of a pellicle film 10 and an inspection light with a wavelength reflected on the surface of the pellicle film 10 and a scattered light reception system 2 for receiving the scattered light from a body to be inspected, a signal processing system 4 for discriminating the location of a foreign object by receiving the signal from the detection system 3, a stage control system 5 for mounting the reticle and pellicle to be inspected, and a display 6 for confirming inspection status. When a foreign object 18 is on a pellicle film rear surface 12, the defect transfer at the lithography process due to the drop of the foreign object 18 of the pellicle film rear surface 12 onto a reticle pattern surface can be prevented by treatment such as renewal. |
