Pattern forming material and pattern forming process

摘要

A pattern forming material which can keep the dimensional accuracy of a pattern to a desired degree, even after a polymer is allowed to stand for a long time after irradiation and before baking, and a process for forming such a pattern forming material, which comprises a copolymer containing units containing a polycyclic aromatic ring, a fused ring containing at least one aromatic ring, or an aromatic ring containing an alicyclic group, a branched alkyl or a halogen, as substituent groups, and units of a monomer containing a photosensitive group, and a compound which forms an acid through irradiation with radioactive rays.