Locating the position of an event in acquired digital data at sub-sample spacing

摘要

A method for characterizing an event in acquired digital data is described where the event has a known shape and a pattern having amplitude and location coefficients is applied to the data for determining a best fit between the data and the pattern as a function of a peak RMS value. The derived RMS value is compared to a threshold value for verifying the existence of the event. The event is characterized as to amplitude and location using the amplitude and location coefficients of the pattern. Such a method is useful in characterizing non-reflective events in acquired optical time domain reflectometry data.