发明名称 |
Mask having a phase shifter and method of manufacturing same |
摘要 |
There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.
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申请公布号 |
US5362591(A) |
申请公布日期 |
1994.11.08 |
申请号 |
US19900593808 |
申请日期 |
1990.10.05 |
申请人 |
HITACHI LTD. ET AL. |
发明人 |
IMAI, AKIRA;HASEGAWA, NORIO;FUKUDA, HIROSHI;TANAKA, TOSHIHIKO |
分类号 |
G03F1/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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