发明名称 |
METHOD FOR EVALUATING ETCHING REACTION SPEED |
摘要 |
PURPOSE:To perform measurement in real time by fitting an electrode cell consisting of a ring-shaped operation electrode and a disk-shaped counter electrode into the chamber of an etching device and then spraying an etching liquid and then measuring cathode limit diffusion current. CONSTITUTION:An electrode cell 20 constituted of two electrodes of platinum- platinum consists of a ring-shaped operation electrode and a disk-shaped counter electrode. The electrode cell 20 is set to an etching device 40 and cathode limit diffusion current is measured. For example. ferric chloride liquid solution is used as the etching liquid. Cathode polarization is performed using a potentiostat and the liquid solution resistance obtained by measuring impedance is canceled by feedback compensation. |
申请公布号 |
JPH06308079(A) |
申请公布日期 |
1994.11.04 |
申请号 |
JP19930100775 |
申请日期 |
1993.04.27 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
UEDA RYUJI;ASAKURA SHUKUJI;CHIYOU SHIKIYOU;TANOSAKI YOSHIO;SUGIURA TAKEO |
分类号 |
C23F1/08;G01N27/416;H01L21/306 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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