发明名称 Insulated gate bipolar transistor having a specific buffer layer resistance
摘要 An n+ buffer layer, that is located between an n- base layer and a p+ substrate, has a resistivity in the range of 0.005-0.03 OMEGA cm and a thickness not more than 10 mu m. Further, the base layer has an impurity concentration not more than (0.3xI1)/(Sx1.6x10-19x6.0x106), where I1 is a rated current in ampere and S is an effective are in cm2.
申请公布号 US5360983(A) 申请公布日期 1994.11.01
申请号 US19930046956 申请日期 1993.04.16
申请人 FUJI ELECTRIC CO., LTD. 发明人 IWAMURO, NORIYUKI
分类号 H01L29/78;H01L29/08;H01L29/739;(IPC1-7):H01L27/082;H01L27/088;H01L29/70 主分类号 H01L29/78
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