| 摘要 |
PURPOSE:To continuously change the transmittance of pulse beams at high speed without performing mechanical drive in an exposure quantity controller for an aligner using pulse beams. CONSTITUTION:Laser beams LB0 from a pulse laser beam source 7 are applied on a reticle R through a beam shaping optical system, an acousto-optic modulator 10, a fly-eye lens 17, condenser lens 21, etc., and the pattern image of a reticule R is projected on a wafer W through a projection optical system PL. The acousto-optic modulator 10 takes out zero-order diffracted light from diffracted light generated from an ultrasonic cell 11 at a diaphragm 14 and the intensity of the zero-order diffracted light is adjusted by controlling the power of the ultrasonics in the ultrasonic cell 11. |
