Verfahren zum Bilden einer Struktur einer Halbleitereinrichtung vom Mehrschichttyp,申请号DE19944414369-传众专利搜索

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发明名称	Verfahren zum Bilden einer Struktur einer Halbleitereinrichtung vom Mehrschichttyp
摘要
申请公布号	DE4414369(A1)	申请公布日期	1994.10.27
申请号	DE19944414369	申请日期	1994.04.25
申请人	MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP	发明人	ISHIBASHI, TAKEO, ITAMI, HYOGO, JP
分类号	G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/308;G03F7/22	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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