发明名称
摘要 PURPOSE:To reduce increase of fog during long storage by irradiating electron beams on an electron beam hardenable resin composition layer through an electron beam semipermeable film closely attached to said layer in an inert gas. CONSTITUTION:The electron bveam hardenable resin composition is hardened by irradiating electron beams on it through the electron beam semipermeable film under the conditions of electron beam irradiation intensity lower than the case of iradiating electron beams much enough not to leave any monomer or any low molecular weight oligomer, thus permitting fog to be remarkably decreased by closely attaching said film to the layer in an inert gas contg. oxygen in an amt. of <=500ppm, and moreover tackiness in high humidity to be prevented.
申请公布号 JPH0685064(B2) 申请公布日期 1994.10.26
申请号 JP19850119178 申请日期 1985.06.01
申请人 KONISHIROKU PHOTO IND 发明人 YAMAZAKI TOSHIAKI;WADA YOSHIHIRO;ARAKI HIROMITSU;HANAWA ITARU;WATANABE KOYO
分类号 G03C1/79;(IPC1-7):G03C1/79 主分类号 G03C1/79
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