| 摘要 |
<p>PURPOSE:To prevent the generation of cracking in a smooth layer and dye layer, etc. even after baking by using a hydrophilic photoresist as the smooth layer. CONSTITUTION:The smooth layer 2 is formed of the hydrophilic photopolymer and the hydrophilic photopolymer such as gelatin having photosensitivity is used. The smooth layer 2 is coated by spin coating, etc. to about 0.5-2.5mum on a solid-state image sensing element and is dried. A mask (exposing pattern) is then imposed thereon and the coating is subjected to UV ray exposure. The exposed coating is developed by warm water, etc. to remove the non-exposed part and to expose a substrate. There is the possibility that the smooth layer is dyed in the succeeding dyeing stage if the hydrophilic photoresist is used for the smooth layer and therefore the smooth layer is subjected preliminarily to an anti-dyeing treatment. The color filter is then provided in the same manner as in the conventional method and further a protective layer is provided thereon.</p> |
