| 摘要 |
A wafer rinsing apparatus includes an ice making hopper for making ice particles by heat exchange between fine droplets of liquid to be frozen and low-temperature liquefied gas. The ice making hopper is connected to a separation device for separating the ice particles and vaporized gas generated from the low-temperature liquefied gas. The ice particles separated by the separation device are jetted onto a wafer by a jetting device, thereby rinsing the surface of the wafer.
|
